Plasma Sputtering

Revision as of 11:46, 27 May 2021 by Rzhou95 (talk | contribs) (Created page with "{|class="infobox" !style="font-size:135%;text-align:center;" | Cressington Sputter Coater |- |center|300px |- |'''Available Targets''': Gold...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search
Cressington Sputter Coater
Available Targets: Gold

A simple and easy-to-use sputter coater for making samples surface’s more conductive for SEM imagery. A vacuum pump is attached to the sputter coater to achieve vacuum conditions and argon is used as the inert chamber gas. A full calibration has not yet been done on the sputter coater, but the thickness of samples is often changed by varying the time of the sputter.

Retrieved from "https://millwiki.mse.gatech.edu/index.php?title=Plasma_Sputtering&oldid=38242"